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Plasma Sources Science and Technology

Impact, Factor and Metrics, Impact Score, Ranking, h-index, SJR, Rating, Publisher, ISSN, and More

Last Updated on September 3, 2024

Impact Score

2023-2024

3.26

h-Index

2023-2024

 123

Rank

2023-2024

 6577

SJR

2023-2024

 0.771

Note: The impact score or impact index shown here is equivalent to the average number of times documents published in a journal/conference in the past two years have been cited in the current year (i.e., Cites / Doc. (2 years)). It is based on Scopus data and can be a little higher or different compared to the impact factor (IF) produced by Journal Citation Report. Please refer to the Web of Science data source to check the exact journal impact factor ™ (Thomson Reuters) metric.

Important Metrics and Factor

Title Plasma Sources Science and Technology
Abbreviation Plasma Sources Sci. Technol.
Publication Type Journal
Subject Area, Categories, Scope Condensed Matter Physics (Q1)
h-index 123
Overall Rank/Ranking 6577
SCImago Journal Rank (SJR) 0.771
Impact Score 3.26
Publisher IOP Publishing Ltd.
Country United Kingdom
ISSN 13616595, 09630252
Best Quartile Q1
Coverage History 1992-2023




Aim and Scope


Frequency: 4 issues per year.

Plasma Sources Science and Technology (PSST) reports on low-temperature plasmas and ionized gases operating over all ranges of gas pressure and plasma density, with varying degrees of ionization. The emphasis of PSST is on the fundamental science of these plasmas, their sources and the processes initiated or sustained by them, as elucidated through theoretical, computational or experimental techniques. Reports that relate to the technology and applications of these plasmas should be closely linked to the science and fundamental processes occurring in the plasma state.


About Plasma Sources Science and Technology


Plasma Sources Science and Technology is a journal covering the technologies/fields/categories related to Condensed Matter Physics (Q1). It is published by IOP Publishing Ltd.. The overall rank of Plasma Sources Science and Technology is 6577. According to SCImago Journal Rank (SJR), this journal is ranked 0.771. SCImago Journal Rank is an indicator, which measures the scientific influence of journals. It considers the number of citations received by a journal and the importance of the journals from where these citations come. SJR acts as an alternative to the Journal Impact Factor (or an average number of citations received in last 2 years). This journal has an h-index of 123. The best quartile for this journal is Q1.

The ISSN of Plasma Sources Science and Technology journal is 13616595, 09630252. An International Standard Serial Number (ISSN) is a unique code of 8 digits. It is used for the recognition of journals, newspapers, periodicals, and magazines in all kind of forms, be it print-media or electronic. Plasma Sources Science and Technology is cited by a total of 3231 articles during the last 3 years (Preceding 2023).


Plasma Sources Science and Technology Impact IF 2023-2024


The Impact IF 2023 of Plasma Sources Science and Technology is 3.26, which is computed in 2024 as per its definition. Plasma Sources Science and Technology IF is decreased by a factor of 0.5 and approximate percentage change is -13.3% when compared to preceding year 2022, which shows a falling trend. The impact IF, also denoted as Journal impact score (JIS), of an academic journal is a measure of the yearly average number of citations to recent articles published in that journal. It is based on Scopus data.

Table Setting

Plasma Sources Science and Technology Impact IF 2024 Prediction


Impact IF 2023 of Plasma Sources Science and Technology is 3.26. If the same downward trend persists, Impact IF may fall in 2024 as well.


Impact IF Trend


Year wise Impact IF of Plasma Sources Science and Technology. Based on Scopus data.


Year Impact IF
2023/2024 Coming Soon
2023 3.26
2022 3.76
2021 4.02
2020 3.51
2019 3.44
2018 4.21
2017 4.11
2016 3.15
2015 3.34
2014 4.03

Plasma Sources Science and Technology h-index


  Table Setting

Plasma Sources Science and Technology has an h-index of 123. It means 123 articles of this journal have more than 123 number of citations. The h-index is a way of measuring the productivity and citation impact of the publications. The h-index is defined as the maximum value of h such that the given journal/author has published h papers that have each been cited at least h number of times.




Plasma Sources Science and Technology ISSN


The ISSN of Plasma Sources Science and Technology is 13616595, 09630252. ISSN stands for International Standard Serial Number.

An ISSN is a unique code of 8 digits. It is used for the recognition of journals, newspapers, periodicals, and magazines in all kind of forms, be it print-media or electronic.

Table Setting

Plasma Sources Science and Technology Rank and SCImago Journal Rank (SJR)


The overall rank of Plasma Sources Science and Technology is 6577. According to SCImago Journal Rank (SJR), this journal is ranked 0.771. SCImago Journal Rank is an indicator, which measures the scientific influence of journals. It considers the number of citations received by a journal and the importance of the journals from where these citations come.

SJR of Plasma Sources Science and Technology by Year


Year SJR
2023/2024 Coming Soon
2023 0.771
2022 0.727
2021 0.855
2020 0.900
2019 1.033
2018 1.160
2017 1.015
2016 1.016
2015 0.995
2014 1.256

Ranking of Plasma Sources Science and Technology by Year


Year Ranking
2023/2024 Coming Soon
2023 6577
2022 6784
2021 5200
2020 5148
2019 4123
2018 3490
2017 4282
2016 4332
2015 4478
2014 3083

Plasma Sources Science and Technology Publisher


Table Setting

Plasma Sources Science and Technology is published by IOP Publishing Ltd.. It's publishing house is located in United Kingdom. Coverage history of this journal is as following: 1992-2023. The organization or individual who handles the printing and distribution of printed or digital publications is known as Publisher.


Call For Papers


Visit the official website of the journal/conference to check the further details about the call for papers.


Abbreviation


The IS0 4 standard abbreviation of Plasma Sources Science and Technology is Plasma Sources Sci. Technol.. This abbreviation ('Plasma Sources Sci. Technol.') is well recommended and approved for the purpose of indexing, abstraction, referencing and citing goals. It meets all the essential criteria of ISO 4 standard.

ISO 4 (International Organization for Standardization 4) is an international standard that defines a uniform and consistent system for abbreviating serial publication titles and journals.


How to publish in Plasma Sources Science and Technology


If your research field is/are related to Condensed Matter Physics (Q1), then please visit the official website of this journal.


Acceptance Rate


The acceptance rate/percentage of any academic journal/conference depends upon many parameters. Some of the critical parameters are listed below.

  • The demand or interest of researchers/scientists in publishing in a specific Journal/Conference.
  • Peer review complexity and timeline.
  • The mix of unsolicited and invited submissions.
  • The time it takes from manuscript submission to final publication.
  • And Many More.

It is essential to understand that the acceptance rate/rejection rate of papers varies among journals. Some Journals considers all the manuscripts submissions as a basis of acceptance rate computation. On the other hand, few consider the only manuscripts sent for peer review or few even not bother about the accurate maintenance of total submissions. Hence, it can provide a rough estimation only.

The best way to find out the acceptance rate is to reach out to the associated editor or to check the official website of the Journal/Conference.



Frequently Asked Questions (FAQs)


What's the latest impact IF of the Plasma Sources Science and Technology?

Plasma Sources Science and Technology latest impact IF is 3.26. It's evaluated in the year 2023. The highest and the lowest impact IF or impact score of this journal are 4.21 (2018) and 3.15 (2016), respectively, in the last 10 years. Moreover, its average IS is 3.68 in the previous 10 years.


What's the SCImago Journal Rank (SJR) of the Plasma Sources Science and Technology?

The Plasma Sources Science and Technology has an SJR (SCImago Journal Rank) of 0.771, according to the latest data. It is computed in the year 2024. In the past 10 years, this journal has recorded a range of SJR, with the highest being 1.256 in 2014 and the lowest being 0.727 in 2022. Furthermore, the average SJR of the Plasma Sources Science and Technology over the previous 10-year period stands at 3.68.


What's the latest h-index of the Plasma Sources Science and Technology?

The latest h-index of the Plasma Sources Science and Technology is 123.


Who's the publisher of the Plasma Sources Science and Technology?

The Plasma Sources Science and Technology is published by the IOP Publishing Ltd., with its country of publication being the United Kingdom.


What's the current ranking of the Plasma Sources Science and Technology?

The Plasma Sources Science and Technology is currently ranked 6577 out of 27955 Journals, Conferences, and Book Series in the latest ranking. Over the course of the last 10 years, this journal has experienced varying rankings, reaching its highest position of 3083 in 2014 and its lowest position of 6784 in 2022.


What's the abbreviation or short name for the Plasma Sources Science and Technology?

The standard ISO4 abbreviation for the Plasma Sources Science and Technology is Plasma Sources Sci. Technol..


Is the "Plasma Sources Science and Technology" classified as a Journal, Conference and Proceedings, Trade Journal or Book Series?

Plasma Sources Science and Technology is classified as a journal that the IOP Publishing Ltd. publishes.


What's the scope or major areas of the Plasma Sources Science and Technology?

The Plasma Sources Science and Technology encompasses the following areas:

  • Condensed Matter Physics

For a more comprehensive understanding of its scope, check the official website of this journal.


What's the ISSN of the Plasma Sources Science and Technology?

The Plasma Sources Science and Technology is assigned the following International Standard Serial Numbers (ISSN): 13616595, 09630252.


What's the best quartile of the Plasma Sources Science and Technology?

The best quartile for the Plasma Sources Science and Technology is Q1 (2023).


What's the coverage history of the Plasma Sources Science and Technology?

The Plasma Sources Science and Technology coverage history can be summarized as follows: 1992-2023.


Credits and Sources


  • Scimago Journal & Country Rank (SJR), https://www.scimagojr.com/
  • Journal Impact Factor, https://clarivate.com/



Impact Score, h-Index, and Other Important Details of These Journals, Conferences, and Books


Journal/Conference/Workshop/Book Title Type Ranking Publisher h-index Impact Score
European Union Politics journal 2569 SAGE Publications Ltd 75 3.24
International Journal of Research and Method in Education journal 5876 Taylor and Francis Ltd. 38 2.50
Howard Journal of Communications journal 10151 Taylor and Francis Ltd. 39 1.66
Sapporo Medical Journal journal 27142 3 0.00
Indian Phytopathology journal 15501 Springer Nature 16 1.09
Journal of Imaging Science and Technology journal 17857 Society for Imaging Science and Technology 45 0.68
Consulting engineer Barrington journal 24079 Cahners Pub. Co. 0 0.00
Transactions on Embedded Computing Systems journal 5892 Association for Computing Machinery (ACM) 64 2.87
East African journal of public health journal 19634 East African Public Health Association 23 0.00
English Literary Renaissance journal 25777 University of Chicago Press 20 0.36

Check complete list




Year wise Impact Score (IS) of Plasma Sources Science and Technology

Impact Score Table

Year Impact Score (IS)
2024/2025 Coming Soon
2023 3.26
2022 3.76
2021 4.02
2020 3.51
2019 3.44
2018 4.21
2017 4.11
2016 3.15
2015 3.34
2014 4.03



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Annual Review of Fluid Mechanics
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Materials Science and Engineering: R: Reports
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Materials Today
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Advanced Functional Materials
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Nano Letters
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Laser and Photonics Reviews
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