Plasma Chemistry and Plasma Processing

Impact, Factor and Metrics, Impact Score, Ranking, h-index, SJR, Rating, Publisher, ISSN, and More

About Plasma Chemistry and Plasma Processing

Plasma Chemistry and Plasma Processing is a journal covering the technologies/fields/categories related to Chemical Engineering (miscellaneous) (Q2); Chemistry (miscellaneous) (Q2); Condensed Matter Physics (Q2); Surfaces, Coatings and Films (Q2). It is published by Springer New York. The overall rank of Plasma Chemistry and Plasma Processing is 12362. According to SCImago Journal Rank (SJR), this journal is ranked 0.462. SCImago Journal Rank is an indicator, which measures the scientific influence of journals. It considers the number of citations received by a journal and the importance of the journals from where these citations come. SJR acts as an alternative to the Journal Impact Factor (or an average number of citations received in last 2 years). This journal has an h-index of 85. The best quartile for this journal is Q2.

The ISSN of Plasma Chemistry and Plasma Processing journal is 02724324, 15728986. An International Standard Serial Number (ISSN) is a unique code of 8 digits. It is used for the recognition of journals, newspapers, periodicals, and magazines in all kind of forms, be it print-media or electronic. Plasma Chemistry and Plasma Processing is cited by a total of 807 articles during the last 3 years (Preceding 2024).

Plasma Chemistry and Plasma Processing Impact IF 2024-2025

The Impact IF 2024 of Plasma Chemistry and Plasma Processing is 2.91, which is computed in 2025 as per its definition. Plasma Chemistry and Plasma Processing IF is increased by a factor of 0.1 and approximate percentage change is 3.56% when compared to preceding year 2023, which shows a rising trend. The impact IF, also denoted as Journal impact score (JIS), of an academic journal is a measure of the yearly average number of citations to recent articles published in that journal. It is based on Scopus data.

Plasma Chemistry and Plasma Processing Impact IF 2025 Prediction

Impact IF 2024 of Plasma Chemistry and Plasma Processing is 2.91. If the same upward trend persists, Impact IF may rise in 2025 as well.

Plasma Chemistry and Plasma Processing h-index

 

Plasma Chemistry and Plasma Processing has an h-index of 85. It means 85 articles of this journal have more than 85 number of citations. The h-index is a way of measuring the productivity and citation impact of the publications. The h-index is defined as the maximum value of h such that the given journal/author has published h papers that have each been cited at least h number of times.

Plasma Chemistry and Plasma Processing ISSN

The ISSN of Plasma Chemistry and Plasma Processing is 02724324, 15728986. ISSN stands for International Standard Serial Number.

An ISSN is a unique code of 8 digits. It is used for the recognition of journals, newspapers, periodicals, and magazines in all kind of forms, be it print-media or electronic.

Plasma Chemistry and Plasma Processing Rank and SCImago Journal Rank (SJR)

The overall rank of Plasma Chemistry and Plasma Processing is 12362. According to SCImago Journal Rank (SJR), this journal is ranked 0.462. SCImago Journal Rank is an indicator, which measures the scientific influence of journals. It considers the number of citations received by a journal and the importance of the journals from where these citations come.

SJR of Plasma Chemistry and Plasma Processing by Year

Ranking of Plasma Chemistry and Plasma Processing by Year

Plasma Chemistry and Plasma Processing Publisher

Plasma Chemistry and Plasma Processing is published by Springer New York. It's publishing house is located in United States. Coverage history of this journal is as following: 1981-2025. The organization or individual who handles the printing and distribution of printed or digital publications is known as Publisher.

Call For Papers

Visit the official website of the journal/conference to check the further details about the call for papers.

Abbreviation

The IS0 4 standard abbreviation of Plasma Chemistry and Plasma Processing is Plasma Chem. Plasma Process.. This abbreviation ('Plasma Chem. Plasma Process.') is well recommended and approved for the purpose of indexing, abstraction, referencing and citing goals. It meets all the essential criteria of ISO 4 standard.

ISO 4 (International Organization for Standardization 4) is an international standard that defines a uniform and consistent system for abbreviating serial publication titles and journals.

How to publish in Plasma Chemistry and Plasma Processing

If your research field is/are related to Chemical Engineering (miscellaneous) (Q2); Chemistry (miscellaneous) (Q2); Condensed Matter Physics (Q2); Surfaces, Coatings and Films (Q2), then please visit the official website of this journal.

Acceptance Rate

The acceptance rate/percentage of any academic journal/conference depends upon many parameters. Some of the critical parameters are listed below.

• The demand or interest of researchers/scientists in publishing in a specific Journal/Conference.
• Peer review complexity and timeline.
• The mix of unsolicited and invited submissions.
• The time it takes from manuscript submission to final publication.
• And Many More.

It is essential to understand that the acceptance rate/rejection rate of papers varies among journals. Some Journals considers all the manuscripts submissions as a basis of acceptance rate computation. On the other hand, few consider the only manuscripts sent for peer review or few even not bother about the accurate maintenance of total submissions. Hence, it can provide a rough estimation only.

The best way to find out the acceptance rate is to reach out to the associated editor or to check the official website of the Journal/Conference.

Credits and Sources

• Scimago Journal & Country Rank (SJR), https://www.scimagojr.com/
• Journal Impact Factor, https://clarivate.com/