JoMM 2025 : Journal of Microelectronic Manufacturing

Call For Papers: Journal of Microelectronic Manufacturing (JoMM)
Dear colleagues,
We are pleased to invite you to contribute to an upcoming Special Topics on Computational Lithography in JoMM, a journal devoted to publishing researches on the cutting-edge microelectronic manufacturing technology. JoMM, produced by JoMMPublish in Altamont, New York, USA, is an open-access journal with free publication. It is supported by the University of the Chinese Academy of Sciences (UCAS) and the Institute of Microelectronics of the Chinese Academy of Sciences (IMECAS). The journal is indexed in major databases including Crossref, DOAJ, CNKI, CSTJ, and CAS. The scope of the journal covers studies of advanced semiconductor manufacturing sciences and technologies from fundamental research to industrial high volume manufacturing applications.
This special issue aims to highlight the cutting-edge progress, persistent challenges, and groundbreaking innovations in Computational Lithography, a pivotal technology for semiconductor manufacturing. By focusing on the developments, implementations, and optimizations of computational lithography techniques, this issue explores transformative breakthroughs across key areas, including:
- Fast and accurate Mask3D modeling
- Mask3D-compatible Hopkins imaging
- Wafer3D imaging theory
- Resist modeling and etching simulations
- Curvilinear mask and OPC
- Inverse lithography technology
- Source mask optimization (SMO)
- GPU and tensor processor hardware accelerations
- Machine learning applied in computational lithography
We invite original research articles, reviews, and perspectives that contribute to the advancement of computational lithography and its applications in cutting-edge semiconductor manufacturing, by tackling critical challenges in pattern fidelity, computational scalability, and process variabilities.

Guest Editors
Dr. David H. Wei, Quantica Computing LLC, San Jose, California, USA
Prof. Xu Ma, Beijing Institute of Technology, Beijing, China

How to Submit
 To submit your work, please visit: http://jommpublish.org/
 For any inquiries or suggestions, please contact the JoMM editorial office.
 E-mail: [email protected]

Thank you and best regards.
Yours sincerely,
David H. Wei & Xu Ma